教育经历：

2009.10–2013.3 日本东京大学，博士

2006.9 –2009.7 中国地质大学（北京），硕士

2002.9 –2006.7 中国地质大学（北京），本科

 

工作经历：

2018.11 –至今 南方科技大学 研究副教授（副研究员）

2016.9 –2018.10 中科院宁波材料技术与工程研究所，“春蕾人才”副研究员

2014.4 –2016.8 中科院宁波材料技术与工程研究所，助理研究员/博士后

2013.4 –2014.3 日本东京大学工学部材料系，特任研究员

 

交叉研究领域：邬苏东副教授的研究领域涵盖等离子体材料工学、薄膜生长及能源器件等交叉学科。特长在于等离子体技术在薄膜材料和纳米材料方面的生长研究及薄膜材料的可控制备。邬苏东副教授是新型中压等离子体化学气相沉积技术（mesoplasma CVD）的开发者之一，所从事研究的材料体系包括半导体薄膜、光学薄膜、固体润滑薄膜、垂直结构石墨烯等，应用领域包括光电器件、能源存储及应变传感器件等。

 

所获荣誉：日本丸文研究交流財団交流研究助成受賞 (2011)

 

代表文章：

1. Q. Yuan, S. Wu, C. Ye, X. Liu, J. Gao, N. Cui, P. Guo, G. Lai, Q. Wei, M. Yang, W. Su, H. Li, N. Jiang, L. Fu, D. Dai*, C.-T. Lin*, K.W.A. Chee*, Sensitivity enhancement of potassium ion (K+) detection based on graphene field-effect transistors with surface plasma pretreatment, Sensors & Actuators: B. Chemical, 285, 333–340, (2019).
2. F. Ren, Z. Lu, H. Zhang, L. Huai, X. Chen, S. Wu*, Z. Peng*, D. Wang, J. Ye, Pseudo-capacitance induced uniform plating/stripping of Li metal anode in Vertical Graphene Nanowalls, Adv. Funct. Mater., 1805638, (2018).
3. Z. Lu, Z. Zhang, X. Chen, Q. Chen, F. Ren, M. Wang, S. Wu*, Z. Peng*, D. Wang, J. Ye, Improving Li anode performance by a porous 3D Carbon Paper Host with Plasma assisted Sponge Carbon Coating, Energy Storage Materials, 11, 47–56, (2018).
4. Z. Lu, S. Zhang, J. Sheng, P. Gao, Q. Chen, Z. Peng*, S. Wu*, and J. Ye*, Rapid crystallization of amorphous silicon films utilizing Ar-H₂ mesoplasma annealing, J. Crystal Growth, 486, 142–147, (2018).
5. Z. Zou, W. Liu, D. Wang, Z. Liu, E. Jiang, S. Wu, J. Zhu, W. Guo, J. Sheng* and J. Ye*, Electron-selective quinhydrone passivated back contact for high-efficiency Si/organic heterojunction solar cells, Sol. Energy Mater. Sol. Cells, 185, 218–225, (2018).
6. S. Sun, W. Liu, Y. Wang, Y. Huan, Q. Ma, B. Zhu, S. Wu, W. Yu, R. Horng, C. Xia, Q. Sun, S. Ding, and D. W. Zhang, Band alignment of In2O3/β-Ga2O3 interface determined by X-ray photoelectron spectroscopy, Appl. Phys. Lett., 113, 031603, (2018).
7. Z. Liu, Z. Yang, S. Wu, J. Zhu, W. Guo, J. Sheng*, J. Ye*, and Y. Cui*, Photoinduced field-effect passivation from negative carrier accumulation for high efficiency Si/PEDOT:PSS heterojunction solar cells, ACS Nano, 11, 12687−12695, (2017).
8. X. Chen, C. Zhang*, T. Kato, X. Yang, S. Wu, R. Wang, M. Nosaka, and J. Luo*, Evolution of tribo-induced interfacial nanostructures governing superlubricity in a-C:H and a-C:H:Si films, Nature Communication, 8, 1675, (2017).
9. X. Wang, Z. Yang, P. Gao, X. Yang, S. Zhou, D. Wang, M. Liao, P. Liu, Z. Liu, S. Wu, J. Ye, and T. Yu, Improved optical absorption in visible wavelength range for silicon solar cells via texturing with nanopyramid arrays, Optics Express, 25(9), 10464, (2017).
10. J. He, Z.i Yang, P. Liu, S. Wu, P. Gao*, M. Wang, S. Zhou, X. Li,* H. Cao, and J. Ye*, Enhanced Electro-Optical Properties of Nanocone/Nanopillar Dual-Structured Arrays for Ultrathin Silicon/Organic Hybrid Solar Cell Applications, Adv. Energy Mater., 1501793, (2016).
11. S. Zhang, Z. Lu, J. Sheng, P. Gao, X. Yang, S. Wu*, J. Ye*, and M. Kambara, In situ annealing and high-rate silicon epitaxy on porous silicon by mesoplasma process, Appl. Phys. Exp., 9, 055506, (2016).
12. D. Wang, J. Sheng*, S. Wu, J. Zhu, S. Chen, P. Gao, and J. Ye*, Tuning back contact property via artificial interface dipoles in Si/organic hybrid solar cells, Appl. Phys. Lett., 109, 043901, (2016).
13. J. Sheng, D. Wang, S. Wu, X. Yang, L. Ding, J. Zhu, J. Fang, P. Gao, and J. Ye*, Ideal rear contact formed via employing a conjugated polymer for Si/PEDOT:PSS hybrid solar cells, RSC Advances, 6, 16010, (2016).
14. Y. Sun, Z. Yang, P. Gao, J. He, X. Yang, J. Sheng, S. Wu, Y. Xiang*, and J. Ye, Si/PEDOT:PSS Hybrid Solar Cells with Advanced Antireflection and Back Surface Field Designs, Nanoscale Res. Lett., 11, 356, (2016).
15. X. Yang, J. Sheng, S. Wu, D. Chen, J. Zhou, S. Zhou, J. He, P. Gao,* and J. Ye*, Colloidal transfer printing method for periodically textured thin films in flexible media with greatly enhanced solar energy harvesting, Mater. Res. Express, 2, 106402, (2015).
16. S. Wu*, T. Iguchi, M. Kambara, T. Yoshida, Improved production yield in silicon epitaxy by reducing pressure in mesoplasma chemical vapor deposition, Appl. Phys. Exp., 7, 086201, (2014).
17. S. Wu*, K. Sawada, T. Ichimaru, T. Yamamoto, M. Kambara, T. Yoshida, High-rate and Wide-area Deposition of Epitaxial Si Films by Mesoplasma Chemical Vapor Deposition, Sci. Tech. Adv. Mater., 15, 035001, (2014).
18. S. Wu*, H. Inoue, M. Kambara, and T. Yoshida, Cavity Ring-Down Spectroscopy Measurement of H(n = 2) Density in Mesoplasma for Fast-Rate Silicon Epitaxy, Jpn. J. Appl. Phys., 52, 071301, (2013).
19. S. Wu*, M. Kambara, T. Yoshdia, Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition, Plasma Chem. Plasma Process, 33, 433-451, (2013).
20. X. Chen, Z. Peng*, Z. Fu, S. Wu, W. Yue, C. Wang, Microstructural, mechanical and tribological properties of tungsten-gradually doped diamond-like carbon films with functionally graded interlayers, Surf. Coat. Tech., 205, 3631-3638, (2011).